Prof. Julien Bachmann
Prof. Julien Bachmann, PhD
Julien Bachmann studied chemistry at the University of Lausanne, Switzerland, and graduated with a Diplôme de chimiste in 2001 (with Carlo Floriani). He then joined the Massachusetts Institute of Technology in the USA to obtain his Ph. D. in inorganic chemistry (with Dan Nocera, 2006). He moved with a Humboldt Fellowship to the Max Planck Institute of Microstructure Physics in Germany to learn the chemistry and physics of solids (with Ulrich Gösele) and worked as a postdoc at the University of Hamburg (with Kornelius Nielsch). He started as an Assistant Professor position (‘Juniorprofessur’, W1) in physics and chemistry in Hamburg in 2009 and was appointed as an Associate Professor (W2) of Inorganic Chemistry at the Friedrich Alexander University of Erlangen-Nürnberg in 2012. In 2017, he was promoted to the Full Professor (W3) status in the framework of the Cluster of Excellence ‘Engineering of Advanced Materials’, and he now leads the Chair for ‘Chemistry of Thin Film Materials’ at FAU.
Prof. Bachmann obtained several teaching prizes. He was awarded a Starting Grant by the FAU’s Excellence Cluster ‘Engineering of Advanced Materials’ (2013) and a Consolidator Grant by the European Research Council (2015). He holds an adjunct position as a Full Professor at Saint Petersburg State University (since 2017) and was invited to Danish Technical University as an Otto Mønsted Guest Professor (2021).
Julien Bachmann can be reached in the IZNF building on Cauerstr. 3, office 2.136, by phone (09131 85 70551) and by e-mail (julien.bachmann@fau.de).
Full publications list (ORCID)
Full publications list (Publons)
Selected publications:
| I. Kundrata, M. K. S. Barr, S. Tymek, D. Döhler, B. Hudec, P. Brüner, G. Vanko, M. Precner, T. Yokosawa, E. Spiecker, M. Plakhotnyuk, K. Fröhlich, J. Bachmann* Small Methods 2022, 2101546 “Additive manufacturing in atomic layer deposition mode” |
| S. Müssig, V. M. Koch, C. Collados Cuadrado, J. Bachmann, M. Thommes,* M. K. S. Barr,* K. Mandel* Small Methods 2021, 2101296 “Spray-Drying and Atomic Layer Deposition: Complementary Tools toward Fully Orthogonal Control of Bulk Composition and Surface Identity of Multifunctional Supraparticles” (Editor’s Choice) |
| P. Büttner, F. Scheler, C. Pointer, D. Döhler, T. Yokosawa, E. Spiecker, E. R. Young,* I. Mínguez-Bacho,* J. Bachmann* ACS Appl. Mater. Interfaces 2021, 13, 11861−11868 “ZnS Ultrathin Interfacial Layers for Optimizing Carrier Management in Sb2S3-based Photovoltaics” |
| P. Büttner, F. Scheler, C. Pointer, D. Döhler, M. K. S. Barr, A. Koroleva, D. Pankin, R. Hatada, S. Flege, A. Manshina, E. R. Young, I. Mínguez-Bacho, J. Bachmann ACS Appl. Energy Mater. 2019, 2, 8747-8756 “Adjusting interfacial chemistry and electronic properties of photovoltaics based on a phase-pure Sb2S3 absorber by atomic layer deposition” |
| V. M. Koch, M. K. S. Barr, P. Büttner, I. Mínguez-Bacho, D. Döhler, B. Winzer, E. Reinhardt, D. Segets, J. Bachmann J. Mater. Chem. A 2019, 7, 25112-25119 “A solution-based ALD route towards perovskite via lead sulfide films” |
| S. Haschke, M. Mader, S. Schlicht, A. M. Roberts, A. M. Angeles-Boza, J. A. C. Barth, J. Bachmann Nature Commun. 2018, 9, 4565 “Direct oxygen isotope effect identifies the rate-determining step of electrocatalytic oxygen evolution reaction at a metal oxide surface” |
| S. Haschke, D. Pankin, Y. Petrov, S. Bochmann, A. Manshina, J. Bachmann ChemSusChem 2017, 18, 3644-3651 “Design rules for oxygen evolution catalysis at porous iron oxide electrode surfaces: Thousand-fold current density increase” |
| O. Brummel, D. Besold, Y. Wu, S. Bochmann, F. Lazzari, F. Waidhas, T. Döpper, U. Bauer, P. Bachmann, C. Papp, H.-P. Steinrück, A. Görling, J. Libuda, J. Bachmann ChemSusChem 2016, 9, 1424-1432 (‘Very Important Paper’) “Energy storage in strained organic molecules: Electrochemical and spectroelectrochemical characterization of norbornadiene and quadricyclane” |
| Y. Wu, D. Döhler, M. Barr, E. Oks, M. Wolf, L. Santinacci, J. Bachmann Nano Lett. 2015, 15, 6379-6385 “Atomic layer deposition from dissolved precursors” |