Ivan Kundrata

Ivan Kundrata

Ivan Kundrata

Photo: Kundrata

Ivan Kundrata (IZNF 02.166) has performed part of his doctoral work in our group in an exchange from the institute of Electrical Engineering of the Slovak Academy of Sciences, with financial support from  the Slovak Academic Information Agency. Ivan works with Atlant 3D Nanosystems on the development of atomic-layer additive manufacturing in our collaborative project Atoplot.

Publications:

  • I. Kundrata, K. Fröhlich, L. Vanco, M. Micusik, J. Bachmann
    “Growth of lithium hydride thin films from solutions: Towards solution atomic layer deposition of lithiated films”
    Beilstein J. Nanotechnol. 2019, 10, 1443-1451
  • K. Fröhlich, I. Kundrata, M. Blaho, M. Precner, M. Ťapajna, M. Klimo, O. Šuch, O. Škvarek
    “Hafnium oxide and tantalum oxide based resistive switching structures for realization of minimum and maximum functions”
    J. Appl. Phys. 2018, 124, 152109
  • K. Kukli, M. Kemell, M. Vehkamäki, M. J. Heikkilä, K. Mizohata, K. Kalam, M. Ritala, M. Leskelä, I. Kundrata, K. Fröhlich
    “Atomic layer deposition and properties of mixed Ta2O5 and ZrO2 films”
    AIP Adv. 2017, 7, 025001